E-beam Shot Count Estimation at 32 nm HP and BeyondCHOI, Jin; SANG HEE LEE; NAM, Dongseok et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737917.1-737917.9Conference Paper

Cost effective pattern inspection system using Xe-Hg lamp in challenge of sub 65nm nodeWON SUN KIM; JIN HYUNG PARK; CHUNG, Dong-Hoon et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 660717.1-660717.9, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Experimental investigation of the impact of LWR on sub-100-nm device performanceKIM, Hyun-Woo; LEE, Ji-Young; SHIN, Jangho et al.I.E.E.E. transactions on electron devices. 2004, Vol 51, Num 12, pp 1984-1988, issn 0018-9383, 5 p.Article

Development of resists for thermal flow process applicable to mass productionKANG, Yool; WOO, Sang-Gyun; CHOI, Sang-Jun et al.SPIE proceedings series. 2001, pp 222-231, isbn 0-8194-4031-0, 2VolConference Paper

A novel Resist material for sub-100nm contact hole patternCHUNG, Jeong-Hee; CHOI, Sang-Jun; YOOL KANG et al.SPIE proceedings series. 2000, pp 305-312, isbn 0-8194-3617-8Conference Paper

Optimization of geometry of alignment mark using rigorous coupled- wave analysis (RCWA)CHALYKH, Roman; KIM, Seong-Sue; WOO, Sang-Gyun et al.SPIE proceedings series. 2005, isbn 0-8194-5732-9, 3Vol, Part 1, 471-479Conference Paper

Influence of material on process focus budget and process window of 80 nm DRAM devicesSUNG WON CHOI; LEE, Sukjoo; SHIN, Jangho et al.SPIE proceedings series. 2005, isbn 0-8194-5732-9, 3Vol, Part 2, 570-577Conference Paper

Design and synthesis of new photoresist materials for ArF lithographyCHOI, Sang-Jun; KIM, Hyun-Woo; WOO, Sang-Gyun et al.SPIE proceedings series. 2000, pp 54-61, isbn 0-8194-3617-8Conference Paper

Plasma Monitoring of Chrome Dry Etching for Mask MakingKWON, Sung-Won; KIM, Dong-Chan; NAM, Dong-Seok et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78230F.1-78230F.13, 2Conference Paper

Trade-off between Inverse Lithography Mask Complexity and Lithographic PerformanceKIM, Byung-Gook; SUNG SOO SUH; BAIK, Ki-HO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791M.1-7379M.11Conference Paper

Full-chip based Sub Resolution Assist Features Correction for Mask ManufacturingBANG, Ju-Mi; MASUMOTO, Issei; JI, Min-Kyu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302F.1-67302F.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

The study of CD error in mid-local pattern area caused by develop loading effectKANG, Man-Kyu; LEE, Jung-Hun; KIM, Seong-Yoon et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67300H.1-67300H.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Towards DFM : Process worthy design and OPC through verification method using MEEF, TF-MEEF and MTTKIM, In-Sung; SUH, Sungsoo; JUNG, Sunggon et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61560L.1-61560L.10, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Novel chemical shrinkage material for small contact hole and small space patterningHATA, Mitsuhiro; HAH, Jung-Hwan; KIM, Hyun-Woo et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 214-221Conference Paper

Mask writing time explosion and its effect on CD control in e-beam lithographySANG HEE LEE; CHOI, Jin; SEONG JUN MIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480J.1-77480J.10Conference Paper

A New Paradigm for Haze Improvement: Retardation of Haze Occurrence by creating Mask Substrate insensitive to Chemical Contamination LevelLEE, Han-Shin; CHOI, Jaehyuck; JUNG, Jin-Sik et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712217.1-712217.11, 2Conference Paper

Optimization of mask manufacturing rule check constraint for model based assist feature generationSHIM, Seong-Bo; KIM, Young-Chang; KI, Won-Tai et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 714030.1-714030.9, 2Conference Paper

Improvement of mask CD uniformity for below 45-nm node technologyLEE, Hojune; BAE, Sukjong; PARK, Junghoon et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302Z.1-67302Z.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Analysis method to determine and characterize the mask mean-to-target and uniformity specificationLEE, Sung-Woo; LEUNISSEN, Leonardus H. A; VAN DE KERKHOVE, Jeroen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810U.1-62810U.9, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Application of bi-layer resist to 70 nm node memory devicesKANG, Yool; JIN HONG; LEE, Shi-Yong et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 663-670Conference Paper

Degradation of pattern quality due to strong electron scattering in EUV maskCHOI, Jin; RAE WON LEE; SANG HEE LEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78230D.1-78230D.13, 2Conference Paper

Analysis of process margin in EUV mask repair with nano-machiningLEE, Su-Young; KIM, Geun-Bae; WOO, Sang-Gyun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71222I.1-71222I.10, 2Conference Paper

Distributed Processing (DP) Based E-beam Lithography Simulation with Long Range Correction Algorithm in E-beam machineKI, Won-Tai; CHOI, Ji-Hyeon; KIM, Byung-Gook et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280E.1-70280E.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variabilitySANG HOON HAN; JIN HYUNG PARK; DONG HOON CHUNG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673024.1-673024.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Pattern type specific modeling and correction methodology at high NA and off-axis illuminationSUH, Sungsoo; KANG, Young-Seog; KIM, In-Sung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 599220.1-599220.8Conference Paper